Jensen Huang predicts that China will develop domestically produced advanced lithography systems by 2030.

ME News report, September 15 (UTC+8), Beating AI Brief: At the All-In Summit, Jensen Huang stated that China will develop its own advanced lithography systems by 2030. He also believes that once the technology matures, China has strong large-scale manufacturing capabilities, and it is only a matter of time before domestic equipment enters local wafer fabs. This assessment is notably more optimistic than that of Zeiss. Frank Rohmund, Head of Semiconductor at Zeiss, recently stated that China may still require approximately 15 years to develop its own EUV lithography machines. Zeiss is a core supplier of ASML’s EUV optical systems. However, the host asked about “advanced lithography systems” without specifically limiting it to EUV, and Huang did not further specify EUV in his response. (Source: BlockBeats)