ME News reports that on April 23 (UTC+8), according to monitoring by Beating, ByteDance’s Seed team has released Seed3D 2.0, a text-to-3D model that generates textured 3D assets from a single image. This upgrade focuses on improved geometric accuracy and material realism, with the API now live on Volcano Ark. Geometric generation employs a coarse-to-fine two-stage strategy: first, a large-parameter DiT model establishes a coarse topology, followed by refinement to recover sharp edges and fine surface details. For materials, an MoE architecture enhances high-resolution detail, while a VLM prior improves stability in material decomposition under unknown lighting conditions, outputting complete PBR maps directly compatible with standard rendering pipelines. In a blind evaluation involving 60 reviewers with 3D modeling experience using approximately 200 test cases, Seed3D 2.0 was compared pairwise against Hunyuan3D-2.5/3.1, Tripo 3.0, Rodin Gen2, HiTem v2.0, and the previous Seed3D 1.0. Preference rates for geometric generation ranged from 65.1% to 98.3%, while preference rates for textured 3D assets all exceeded 69%. For downstream applications, Seed3D 2.0 can decompose 3D assets into independent components and add joint information, outputting URDF format compatible with simulation engines such as Isaac Sim, enabling dynamic interaction scenarios like robotic grasping. At the scene level, it supports input via text, multi-view images, or video to combine multiple assets and generate complete scenes. (Source: BlockBeats)
ByteDance Seed Team Launches Seed3D 2.0 with Enhanced Geometry and Material Generation
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ByteDance's Seed team launched Seed3D 2.0 on April 23, enhancing geometry and material generation for 3D assets from a single image. Built on MetaEra, the model employs a Coarse-to-Fine strategy and MoE architecture to achieve realism. It supports URDF output and scene composition from text, images, or videos. The API is now available on Huoshan Fangzhou. Traders using on-chain trading signals may find this update relevant for support and resistance analysis in related technology sectors.
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